Distinguished University Professor of Chemical and Biomolecular Engineering S.V. Babu has won the 2017 Intel Outstanding Researcher Award for his “research in the field of Chemical Mechanical Planarization” and contributions to the “Fundamentals of Chemical Mechanical Polish (CMP) surface science” and delivering “a deeper understanding.”
This award was first given in 2012 and 2013 and then again in 2017. It was awarded by Intel’s Semiconductor Technology Council and associated Strategic Research Sectors. Winners are chosen by careful consideration of their insights, industrial relevance, technical difficulty, communications, and potential student hiring associated with their research program.
Five other researchers from around the world are also receiving this award.
In 2017 Babu was also honored with the Lifetime Achievement Award at the International Conference on Planarization Technology (ICPT) 2017 meeting at Katholic University in Leuven, Belgium. In April 2017, he was also honored for his 20 years of chemical planarization (CMP) research at Clarkson by the Intel Portland Technology Development CMP staff at the North America CMP User’s Group meeting in Portland, Ore.