News & Events
Clarkson University’s Center For Advanced Materials Processing Makes $100 Million Impact On New York Economy
The last four years have seen technology transfer increase dramatically at Clarkson University’s Center for Advanced Materials Processing (CAMP). Based on the annual reports submitted by CAMP to the New York State Office of Science, Technology & Academic Research (NYSTAR), and announced by Clarkson Distinguished University Professor and Director of CAMP, S.V. Babu, the economic impact CAMP has had on New York businesses over the past four years is nearly $100 million. These same reports also credit the technology emanating from CAMP with creating 57 New York jobs.
“Over the past four years we have continuously increased the scope of our research and the transfer of technology developed by CAMP to industry. We have been able to accomplish this objective while being true to the University’s mission of pursuing excellence in our undergraduate education,” remarked Babu.
The Center receives funding from corporations, NYSTAR, U.S. Government agencies and Clarkson University. The CAMP mission is to “perform innovative research and conduct educational efforts on the synthesis and processing of advanced materials of interest to industry.”
The NYSTAR report listed 24 New York companies that have benefited from their collaboration with Clarkson by realizing cost savings, increased revenues, or made capital improvements as a direct result of the technology transferred at CAMP. Those companies include: Ames Goldsmith, APEX, Buffalo Wire, Composite Factory, Corning, DeFelsko, Ferro, Ferronics, GE, GM Powertrain, Hoosier Magnetics, Indium, Infotonics, Kodak, IBM, Nanodynamics, Optimax, Praxair, Reynolds Tech, Ruppert & Patasnick, Unifrax, Wyeth, Universal Photonics, and Xerox.
The technology fields currently being emphasized by CAMP are: colloid and surface science; colloidal dispersion and processing; nanosystems, particle transport, deposition and removal; chemical-mechanical planarization; particle synthesis and properties; and thin films and coatings.