CLARKSON UNIVERSITY · POTSDAM · NEW YORK 13699 · VOLUME 20 NO 4 · JUNE 2005
 

Clarkson’s CAMP has a New Chemical Mechanical Planarization Facility and Cleanroom

Clarkson's Center for Advanced Materials Processing (CAMP) has a new chemical mechanical planarization (CMP) facility which will allow investigators to conduct cutting edge research and influence the future direction of CMP technology. It will also provide students with an excellent opportunity to learn and use the most up to date equipment available in the field.

Almost all technology wonders that enable mankind to do things faster, more efficiently, and sometimes effortless today, are a direct result of the advancement in semiconductor manufacturing processes. None of the advanced microelectronic devices could be built today without the continuous progress in shrinking the minimum feature size and increasing the circuitry complexity at the wafer level. One of the most important innovations that enables the semiconductor industry to meet such challenges is chemical mechanical planarization. In today’s advanced wafer fabrication plant, CMP is an integral part of the manufacturing flow.

The Center for Advanced Materials Processing (CAMP) at Clarkson University has been in the forefront for CMP technology research and development. More specifically, a group of faculty (Professors Yuzhuo Li, Egon Matijevic’, Richard Partch, Dipankar Roy, Shankar Subramanian, Goodarz Ahmadi, and Ian Suni) led by Distinguished University Professor / CAMP Director S.V. Babu has made significant contributions to the progress of addressing many colloidal and interfacial issues encountered in surface nano-structuring technologies that are critical to the semiconductor manufacturing processes.

CAMP and Clarkson University Host International Colloid and Surface Science Symposium

More than 600 scientists from two dozen countries came to Potsdam, New York, on June 12 to participate in the 79th American Chemical Society’s Colloid and Surface Science Symposium hosted by Clarkson University and the Center for Advanced Materials Processing (CAMP). CAMP Distinguished Professor of Chemistry Janos Fendler served as chair of the Symposium , CAMP Professor Yuzhuo Li served as the General Program Chair, CAMP Professor Dan Goia served as Chair for Industrial and Government Relations, and Carol Paulsen served as Executive Secretary.


CAMP Professor Yuzhuo Li (the General Program Chair) speaks during the opening ceremony of the 79 th American Chemical Society Colloid and Surface Science Symposium held at Clarkson University during the month of June.

This annual gathering of the world’s preeminent chemists and engineers (last held at Clarkson in 1995) began with a reception and opening remarks by Clarkson University President Anthony Collins, CAMP Distinguished Professor of Chemistry Janos Fendler (chair of the Symposium), and Distinguished University Professor / CAMP Director S.V. Babu. Plenary Lectures were presented by Sir John Thomas, Professor Gabor Somorjai, Professor Marie-Paule Pileni, Dr. Christy Haynes (Victor K. LaMer Award Lecture), and Dr. Yunfeng Lu (Unilever Award Lecture).

 

 

Class 10 Cleanroom for Chemical Mechanical Planarization Research

Research Project between CAMP and APEX Technologies Results in the New Company United Materials

A new company named United Materials has been formed as the result of a successful research project between CAMP and APEX Technologies. This new company is introducing its first commercial product launch during the summer of 2005 and is beginning to perform extensive research in Potsdam through the formation of the Laboratory of Synergetic Technologies. The Laboratory, located in Peyton Hall at Clarkson University, was recently established to continue a close collaboration with CAMP and to attract corporate interest through technology transfer.

United Materials and the Laboratory of Synergetic Technologies were founded based on the discovery of an unusual, nearly quantum-like, dependence of a basic law underlying the relationship of supersonic abrasivejet technology interacting with subject materials. Conventional abrasivejet technology wastes billions of pounds of abrasive materials each year, while this new breakthrough transforms current abrasivejet methods into a virtually waste free technology. Precious byproducts such as nano-powders and materials with nano-structured surfaces are also realized as a result of the new approach, which allows up to three products to be made simultaneously in one operation.

 

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