to Sponsor its Eighth International Symposium on Chemical-Mechanical
will hold its Eighth International Symposium on Chemical-Mechanical
Polishing during the month of August. It will be held
at the Hilton Resort in Lake Placid, NY from August
10 - 13, 2003. This meeting is Co-Chaired by CAMP Director/Vice
Provost S.V. Babu, Dr. Michael Oliver (Rodel), Dr. Robert
Her (Ferro), and Dr. Manabu Tsujimura (Ebara Corporation).
It will include presentations by industrial and university
representatives and a poster session displaying CAMP's
research activities on CMP.
Annual Technical Meeting
year's Technical Meeting was a great success. The CAMP
Meeting was held in Saratoga Springs, New York during
the month of May. It had more than 40 posters and over
80 attendees including representatives of industry,
university, and New York State Economic Development
organizations. Dr. Paul Horn (Senior Vice President
and Director of Research) of IBM and Dr. Dominic Ventura
(Vice President for Global Technical Services) of Wyeth
Pharmaceuticals delivered keynote speeches. Also Dr.
Russell Bessette, Executive Director of New York States's
Office of Science, Technology, and Academic Research
(NYSTAR) gave an introductory talk about "New Initiatives
at NYSTAR." Details of this meeting will be included
in the September Annual Report Newsletter.
Professor Dan Goia
Dr. Dan Goia Becomes Associate Professor in Chemistry
Dan Goia becomes Associate Professor in Clarkson University's
Department of Chemistry, effective July 1, 2003. He
served as CAMP's Research Associate Professor and received
his Ph.D. in Chemistry in 1998 from Clarkson University
under the mentorship of Professor Egon Matijevic' (the
Victor K. LaMer Chair in Colloid and Surface Science).
Professor Goia has over twenty years of industrial experience
in the area of fine and ultra-fine particles (metals,
metal oxides, pigments, drugs). He managed the research
and development activities of Degussa's Electronic Materials
Division for twelve years and held the position of R
& D Director for several years. He extended this Directorship
to Degussa-Huels' successor company "dmc2," a technological
and market leader in the field of metallic particles
for electronic applications.
Goia has made significant theoretical and practical
contributions in the area of chemical precipitation,
especially of highly monodispersed metallic particles.
These materials (used extensively in catalysis and electronics)
are characterized by a high degree of control over their
critical properties such as particle size, size distribution,
morphology, internal structure, and composition. In
addition, Professor Goia has a number of patents and
professional publications. His role at CAMP is to help
strengthen existing contacts between CAMP and its industrial
partners, and to initiate contacts and nurture relations
with new partners in new technological fields. He is
also very much involved in the establishment of CAMP's
Research Center for Metallic Particles.