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CAMP to Sponsor its Eighth International Symposium on Chemical-Mechanical Polishing (CMP)

CAMP will hold its Eighth International Symposium on Chemical-Mechanical Polishing during the month of August. It will be held at the Hilton Resort in Lake Placid, NY from August 10 - 13, 2003. This meeting is Co-Chaired by CAMP Director/Vice Provost S.V. Babu, Dr. Michael Oliver (Rodel), Dr. Robert Her (Ferro), and Dr. Manabu Tsujimura (Ebara Corporation). It will include presentations by industrial and university representatives and a poster session displaying CAMP's research activities on CMP.

CAMP Annual Technical Meeting

This year's Technical Meeting was a great success. The CAMP Meeting was held in Saratoga Springs, New York during the month of May. It had more than 40 posters and over 80 attendees including representatives of industry, university, and New York State Economic Development organizations. Dr. Paul Horn (Senior Vice President and Director of Research) of IBM and Dr. Dominic Ventura (Vice President for Global Technical Services) of Wyeth Pharmaceuticals delivered keynote speeches. Also Dr. Russell Bessette, Executive Director of New York States's Office of Science, Technology, and Academic Research (NYSTAR) gave an introductory talk about "New Initiatives at NYSTAR." Details of this meeting will be included in the September Annual Report Newsletter.

 

CAMP'S SEVENTH CMP SYMPOSIUM
Professor Dan Goia

CAMP's Dr. Dan Goia Becomes Associate Professor in Chemistry

Dr. Dan Goia becomes Associate Professor in Clarkson University's Department of Chemistry, effective July 1, 2003. He served as CAMP's Research Associate Professor and received his Ph.D. in Chemistry in 1998 from Clarkson University under the mentorship of Professor Egon Matijevic' (the Victor K. LaMer Chair in Colloid and Surface Science). Professor Goia has over twenty years of industrial experience in the area of fine and ultra-fine particles (metals, metal oxides, pigments, drugs). He managed the research and development activities of Degussa's Electronic Materials Division for twelve years and held the position of R & D Director for several years. He extended this Directorship to Degussa-Huels' successor company "dmc2," a technological and market leader in the field of metallic particles for electronic applications.

Professor Goia has made significant theoretical and practical contributions in the area of chemical precipitation, especially of highly monodispersed metallic particles. These materials (used extensively in catalysis and electronics) are characterized by a high degree of control over their critical properties such as particle size, size distribution, morphology, internal structure, and composition. In addition, Professor Goia has a number of patents and professional publications. His role at CAMP is to help strengthen existing contacts between CAMP and its industrial partners, and to initiate contacts and nurture relations with new partners in new technological fields. He is also very much involved in the establishment of CAMP's Research Center for Metallic Particles.

The CAMP newsletter is published four times per year by the Center for Advanced Materials Processing, a NYSTAR-designated Center for Advanced Technology located at Clarkson University.
Editor: Dana M. Barry.
Equal Opportunity Policy. Clarkson University does not discriminate on the basis of race, gender, color, creed, religion, national origin, age, disability, sexual orientation, veteran or marital status in provision of educational opportunity or employment opportunities and benefits.

Center for Advanced Materials Processing
Clarkson University
Box 5665 Potsdam,
New York 13699-5665

S.V. Babu, Director & Vice Provost (babu@clarkson.edu)
Edward P. McNamara, Deputy Director
 (mcnamara@clarkson.edu)

Phone: 315-268-2336, FAX: 315-268-7615, e-mail: leila@clarkson.edu
web site: http://www.clarkson.edu/camp

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