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Victor K. LaMer Professor Egon Matijevic Receives Golden Knight Award

Professor Egon Matijevic (the Victor K. LaMer Chair in Colloid and Surface Science at Clarkson University), who is a Clarkson honorary degree recipient, was recently honored with Clarkson University’s highest alumni honor, the Golden Knight Award. This award is presented each year to alumni who have distinguished themselves either by service to Clarkson through Alumni Association activities, or have demonstrated outstanding career achievement, bringing distinction to themselves and to Clarkson. Other recipients of this award (presented during the 2006 Alumni Reunion weekend) include Ann B. Carlson, Peter J. Gordon, P. Hunter Peckham, and George A. Schiavone.

Professor Matijevic was born in Croatia, Yugoslavia. He received a Bachelor of Science degree in chemical engineering from the University of Zagreb in 1944, a Ph.D. in chemistry in 1948 and a Doctor Habil in 1952. Matijevic began his career at Clarkson 50 years ago. Over the course of his teaching career, he was awarded honorary doctoral degrees from Lehigh University in Bethlehem, Pennsylvania, in 1977; Maria Currie-Sklodowska University in Lublin, Poland, in 1990; Clarkson University in 1992; University of Zagreb, Croatia, in 1998; the National University of General San Martin, Buenos Aires, Argentina, in 2003; and the University of Ljubljana in Slovenia in 2003.

Professor Matijevic', a renowned chemist, holds 15 patents, is the author of more than 550 scientific papers, and is the only individual to ever receive all three major awards of the American Chemical Society in his field of science. In addition, Charles and Lucia Shipley donated $2 million to Clarkson University for an endowed chair in his name to honor his lifetime of professional achievements in colloid chemistry. Professor Matijevi f has delivered many plenary and keynote lectures around the world and has numerous awards to his name. Also he has attracted millions of dollars of research support, was instrumental in the founding of the Institute of Colloid and Surface Science at Clarkson University, and played a vital role in the emergence of Clarkson’s Center for Advanced Materials Processing (CAMP) and its recognition as a Center for Advanced Technology (CAT) in New York State.

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Electrohydrodynamic Flows during Corona Discharge

Professor Ahmadi and his students, along with Dr. Fan of Xerox, are studying electrohydrodynamic flows in corotrons in electrophotographic machines (printers and copiers). They developed a computational model for analyzing electrohydrodynamic flows during corona discharge.  They are in the process of extending their computational model to include transport and deposition of charged toner particles in the presence of a strong electric field.  They showed that electrohydrodynamics could strongly affect the transport and deposition of small particles in corona devices.  In addition, Professor Ahmadi is collaborating with Dr. Sadasivan of Kodak on a project about the aerodynamic focusing of nanoparticle beams.

Computational and Experimental Techniques for Human Health and Security in Indoor Environments

Professors McLaughlin, Ahmadi and Helenbrook, in collaboration with their colleagues at Syracuse University, are developing tools that allow for technology innovations for creating new Intelligent Environmental Quality Systems (i-EQS) for improved health and security in indoor environments. The specific objective is to develop experimentally validated computational tools for predicting the airflow and transport and migration of aerosols in the indoor environment. The study will be focused on assessing personal exposure due to exchanges between the breathing zones of occupants in indoor environments. These tools will provide the basis to develop real time prediction and control systems for intelligent built environmental systems to improve human health as well as for increased security.

COLLOIDAL DISPERSIONS AND PROCESSING

Novel Polymerization Techniques and New Polymer Nanocomposite and Biodegradable Materials

Research in Professor Devon Shipp's laboratories centers on novel polymerization techniques and new polymer materials, in particular nanocomposites and biodegradable polymer networks. Over the past year a number of new developments have taken place in these areas. Professor Shipp also completed a 6 month sabbatical appointment in the research labs of Bausch and Lomb, Rochester New York. During this time his expertise in living radical polymerization methods was utilized in the development of new biomaterials for contact lenses and related solution technologies.

The synthesis of polymer-layered silicate nanocomposites, where the polymers have well-defined molecular weights and molecular weight distributions, has been achieved using three variations of living radical polymerization, viz. atom transfer radical polymerization (ATRP), nitroxide-mediated polymerization (NMP) and reversible addition-fragmentation chain transfer (RAFT) polymerization. More information can be found at www.clarkson.edu/~shippda.

Other projects in Professor Shipp's laboratory that utilize the group's expertise in polymer synthesis include: (a) the production of polymer modified TiO 2 particles for potential use in photovoltaic cells, (b) the synthesis and study of biodegradable polymer network structures, (c) the development of methods to make highly uniform and surface-functionalized polymer spheres for use as templates for semi-conductor nanoparticle deposition, and (d) the synthesis of well-defined and functional poly(vinyl acetate) and poly(vinyl alcohol), and block copolymers thereof.

CHEMICAL-MECHANICAL PLANARIZATION

Chemical-Mechanical Planarization

Professor S.V. Babu’s research group is continuing its fundamental investigations of various aspects of chemical-mechanical planarization (CMP) of metal and dielectric films. The recent emphasis has been on developing novel slurry formulations that are more active chemically for low pressure planarization of Cu, while ensuring appropriate selectivity with respect to the underlying barrier and low-k dielectric films. Simultaneously, defects should be minimized and dishing and erosion must satisfy very stringent specifications. While hydrogen peroxide is likely to remain the primary oxidizer in such slurries due to its multiple advantages, there appear to be several candidates that include amines (glycine, serine or ethylenediamine) and carboxylic acids (oxalic, acetic, citric, malonic, succinic, glutaric, etc.) or even their mixtures for the role of a complexing/chelating agent. Also, investigations of controlled selectivities in material removal when oxide, nitride and/or poly-Si films are being polished have led to several candidate slurries. Defect mitigation while using abrasive slurries and investigation of ECMP also remain of great interest.

Professor Babu and his group, along with Professor Roy, have recently identified some anionic surfactants that can act as very efficient dissolution inhibitors for Cu CMP. A small amount of BTA significantly enhanced this protective ability by forming a very compact passive film on the Cu surface. The associated reduction in removal rates even at low down forces is relatively small. It was shown that suppression of the dissolution rate to < 1 nm/min at 40 degree C is necessary to achieve high planarization efficiencies. These reagents may also help to minimize defects and with wafer cleaning.

Finally, last month CAMP recently received a $399,700 CAT development award to expand its CMP project work with four NY state companies.