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Seventeen research projects were supported by the Centers for Advanced Technology (CAT) Program of New York State's Office of Science, Technology, and Academic Research (NYSTAR) in the 2000 - 2001 fiscal year. Project titles and principal investigators are listed below for each research area.

Particle Synthesis and Properties Nanoparticle/Polymer Composites
    -R. Mackay

Thin Films and Coatings High Speed Powder Coating Process
    -D. Aidun
Construction of Electroactive Self-Assembled Films
    -J. Fendler

Particle Transport, Deposition and Removal
Transport, Deposition and Removal of Charged Nanoparticles
    -G. Ahmadi
Laser-Based Submicron Particle Removal
    -C. Cetinkaya & A.     Busnaina
Theoretical and Experimental Studies on Particle Adhesion for an Improved Removal Process
    -R. Partch & C. Cetinkaya

Colloidal Dispersions and Processing
Oily Bubbles - Light Scattering Systems
    -D. Rasmussen & J.     Fendler
Heteroaggregation of Colloidal Particles in the Presence of Polyamines
    -M. Borkovec
Slurry Flow
    -G. Campbell
Improving Foam Technology by Synthesis and Surface Modeling of Expandable Filler Particles
    -R. Partch & D. Shipp

Chemical-Mechanical Planarization (CMP) Modeling of Chemical-Mechanical Polishing (CMP)
    -G. Ahmadi
Post-CMP Cleaning of Copper Films Using Non-Contact Cleaning
    -A. Busnaina Measurements of the Adhesion Characteristics of Slurry Particles on Cu Films
    -A. Busnaina
Reduction of Metal Dishing in Read/Write Head CMP
    -Y. Li
Synergy Between Chemical and Mechanical Removal in CMP
    -R.S. Subramanian

Supporting Technologies Optimization of Metal Injection Molding for Complex Shapes
    -D. Aidun
Adhesion of Elastomer Surfaces Using Experimental and Analytical Techniques
    -D. Penumadu

The following projects are being funded during 2001-2002.

Particle Synthesis and Properties
Spinning Disk Reactor Technology for Nanoparticle Production
    - S.V. Babu

Thin Films and Coatings
Processing of Low-k Dielectric Films
    -S.V. Babu
Deposition of Polycrystalline Diamond Films Using a New Process
    -L. L. Regel

Particle Transport, Deposition and Removal
Oscillating Cryogenic Argon and CO2 Jets for Particle Removal and Surface Cleaning
    -G. Ahmadi
Nanoparticle Removal
with a Pulsed-Laser-
Experimental Phase
    -C. Cetinkaya & R.
    Partch
A Novel Method for Dry-Stripping of Thin Films and Residue Removal
    -C. Cetinkaya

Colloidal Dispersions and Processing
Flow Characteristics of Slurries as a Function of Particle Size and Charge
    -G. Campbell

Chemical-Mechanical Planarization (CMP)
Modeling of Chemical-Mechanical Polishing (CMP) G. Ahmadi
Laser Polishing (LP) of Wafers for IC
    -D. Aidun
Diamond Slurries for Noble Metal CMP
    -Y. Li
Reactive Liquid Systems for STI CMP
    -Y. Li
Some Fundamental Issues in Chemical-Mechanical Planarization in an Orbital Tool    
     -R.S. Subramanian
Copper Electropolishing for Damascene Planarization
    -I. Suni

Nanosystems
Transport Models for Nano-Scale MOS Devices with Applications to Computer-Aided Design for Next-Generation Integrated Circuits
    -M. Cheng, G.
    Ahmadi, & V. Privman
Modeling of Synthesis of Well-Defined Nanosize Particles and Monodispersed Colloids
    -V. Privman

Supporting Technologies Development of the Prototype of a new Condensation Nuclei Counter
    -P. Hopke

CAMP Professor John Moosbrugger Promoted CAMP Professor John Moosbrugger has been promoted to Full Professor and named Chair of the University's Department of Mechanical and Aeronautical Engineering. He has many awards to his name, is noted for his excellence in teaching and is a faculty adviser of the Student Projects for Engineering Experience and Design (SPEED) Program, which received the prestigious 2001 Boeing Outstanding Educator Award. His research interests are in the area of cyclic plasticity, multiaxial plasticity, and viscoplasticity. In addition, Professor Moosbrugger is Associate Technical Editor of the ASME Journal of Mechanical Design and is recognized nationally for his contributions in cyclic plasticity research. __________________________ CAMP Sponsors Sixth International Symposium on Chemical-Mechanical Polishing (CMP) CAMP sponsored its sixth very successful International Symposium on Chemical-Mechanical Polishing. The four-day symposium/workshop held (August 12 - 15, 2001) at the Hilton Resort in Lake Placid, New York, attracted over 100 participants from around the world. Attendees were from the United States, and other Countries such as Belgium and Japan. This meeting was cochaired by Dr. Manabu Tsujimura (Ebara Corporation), Dr. Kathleen Perry (Cabot Microelectronics), Dr. Mansour Moinpour (Intel), and Vice Provost/CAMP Director S.V. Babu. The meeting began with the presentation "The Bridge from Nanometer to Micrometer Dispersions" by Clarkson University Professor Egon Matijevic' (the Victor K. LaMer Chair). It also included presentations by industrial and university representatives and a poster session displaying CAMP's research activities on CMP.

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