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Invention Disclosures

In this Section

 

 

Invention Disclosures:   

  •  Nondestructive testing for plasma smear in through holes using SLAM: S.V. Babu, J. Hoffarth, J. Welsh, IBM Tech. Disclosure Bulletin (1985). 
  •  Reactive gas mixtures for plasma hole cleaning: V. Bui, J. Hoffarth, B. Suryadevara (S.V. Babu), IBM Tech. Disclosure Bulletin, 27, 3175 (1984).
  •  Etch gas distribution manifold for plasma reactor: V. Bui, B.V. Suryadevara (S. V. Babu), J. Welsh, IBM Tech. Disclosure Bulletin, 27, 1978 (1984). 
  • Determining endpoint of plasma desmear: Neng‑Hsing Lu, B. Suryadevara (S.V. Babu), IBM Tech. Disclosure Bulletin, 27, 1544 (1984).
  • Exhaust flowmeter/mass spectrometer plasma process monitor: S.V. Babu, V. Bui, J. Hoffarth, J. Rembetski and J. Wilson, IBM Tech. Disclosure Bulletin (1985).
  • Method to increase the throughput rate of in‑line plasma processes: S.V. Babu, J. Rembetski, W. Mlynko, J. Hoffarth, A. Knoll, IBM Tech. Disclosure Bul­letin (1985).
  • Method and apparatus for the production of diamond films at low temperatures: J. Seth, R. Padiyath, and S.V. Babu, Research Corporation Technologies (1992).

Dr. S. V. Babu