Photo-Acoustics Research Laboratory
Cetinkaya's nanoparticle removal group develops laser ultrasonic techniques for use in the semiconductor industry for precision cleaning of surfaces. The challenge is to remove tiny particles - smaller than 100 nanometers - from materials used in semiconductor production, without causing any damage to the surface being cleaned.
One technique used for these purposes is laser-induced plasma, in which pulses from lasers generate shockwaves that clean the surface. But these shockwaves have the potential to damage or alter the surface being cleaned. Cetinkaya and his team investigated the primary causes for material alterations and damage and developed a technique to prevent such damage.
The research group received support from International SEMATECH, Intel Coporation, and NSF.








